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拉曼光谱仪
红外光谱仪
超快离子迁移光谱仪(IMS)
扫描探针显微镜 / 原子力显微镜 / 近场光学扫描电镜
Nanoindentation
脉冲激光沉积系统(PLD)
量热仪
红外金像控温炉
脉冲火化烧结炉(SPS)
Dynamic Sensing
SPS-放电等离子烧结炉(Rx)



脉冲激光沉积系统(PLD)

PLD (Pulsed Laser Deposition) is a technology that allow transfer of a material from a target to a substrate with the composition/stochiometry intact.


With PLD ceramic materials like oxides, nitrides and also metals and alloys, are transferred without change. The PLD equipment is complete with laser, chamber, gases, pumps, gauges... it is even delivered under vacuum. Installation time is just a few hours.

This PLD equipment applies an advanced technique for controlling film thickness and evenness, built on careful calculations and control of rotation and movement of target and substrate stages. This allows for an economical use of target and an optimal production of coatings. The basic system has ports for additional optional products like RHEED (Reflection High Energy Electron Diffraction) and a laser heater. The RHEED is designed to work even at pressure levels of up to 300 mtorr. The substrate stage allows tilting +/- 3 degrees , which will give optimal conditions for good RHEED images.

A larger system for Laser MBE (Molecular Beam Epitaxy), called Laser Star, is also available. It has a central UHV chamber, to which as many as five different process chambers can be added. This allows complex processing without venting the substrate. Also here RHEED and Laser Heaters can be used, as well as processes like sputtering and e-beam evaporation.

Contact us at K-analys for more information!


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